Products archive

ArF Immersion Scanners

NSR-S631E

Performance

Swipe horizontally to view full table.

Resolution	≦ 38 nm
NA	1.35
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	SMO^1: ≦ 1.7 nm, MMO^2: ≦ 2.3 nm
Throughput	≧ 250 wafers/hour (96 shots), ≧ 270 wafers/hour (96 shots, optional)

*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S631E#1 to S631E#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S631E#1 to S631E#2)

NSR-S630D

Performance

Swipe horizontally to view full table.

Resolution	≦ 38 nm
NA	1.35
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	SMO^1: ≦ 1.7 nm, MMO^2: ≦ 2.5 nm
Throughput	≧ 250 wafers/hour (96 shots)

*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S630D#1 to S630D#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S630D#1 to S630D#2)

NSR-S622D

Performance

Swipe horizontally to view full table.

Resolution	≦ 38 nm
NA	1.35
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	SMO^1: ≦ 2 nm, MMO^2: ≦ 3.5 nm
Throughput	≧ 200 wafers/hour (125 shots)

*1Single Machine Overlay: machine-to-self overlay accuracy (NSR-S622D#1 to S622D#1)
*2Mix and Match Overlay: machine-to-machine overlay accuracy (NSR-S622D#1 to S622D#2)

NSR-S621D

Performance

Swipe horizontally to view full table.

Resolution	≦ 38 nm
NA	1.35
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	≦ 2 nm
Throughput	≧ 200 wafers/hour (125 shots)

NSR-S620D

Performance

Swipe horizontally to view full table.

Resolution	≦ 38 nm
NA	1.35
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 × 33 mm
Overlay	≦ 3 nm
Throughput	≧ 180 wafers/hour (300 mm wafer, 125 shots)

NSR-S610C

Performance

Swipe horizontally to view full table.

Resolution	≦ 45 nm
NA	1.30
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Overlay	≦ 6.5 nm
Throughput	≧ 130 wafers/hour (300 mm wafer, 76 shots)

NSR-S609B

Performance

Swipe horizontally to view full table.

Resolution	≦ 55 nm
NA	1.07
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 7 nm
Throughput	≧ 130 wafers/hour (300 mm wafer, 76 shots)

ArF Scanners

NSR-S320F

Performance

Swipe horizontally to view full table.

Resolution	≦ 65 nm
NA	0.92
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	≦ 3 nm
Throughput	≧ 200 wafers/hour (125 shots)

NSR-S310F

Performance

Swipe horizontally to view full table.

Resolution	≦ 65 nm
NA	0.92
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	≦ 7 nm
Throughput	≧ 174 wafers/hour (76 shots)

NSR-S308F

Performance

Swipe horizontally to view full table.

Resolution	≦ 65 nm
NA	0.92
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 8 nm

NSR-S307E

Performance

Swipe horizontally to view full table.

Resolution	≦ 80 nm
NA	0.85
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 12 nm

NSR-S306C

Performance

Swipe horizontally to view full table.

Resolution	≦ 100 nm
NA	0.78
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 20 nm

NSR-S305B

Performance

Swipe horizontally to view full table.

Resolution	≦ 110 nm
NA	0.68
Exposure light source	ArF excimer laser (193 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 30 nm

KrF Scanners/KrF Steppers

NSR-S210D

Performance

Swipe horizontally to view full table.

Resolution	≦ 110 nm
NA	0.82
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Maximum exposure field	26 mm × 33 mm
Overlay	≦ 9 nm
Throughput	≧ 176 wafers/hour (76 shots)

NSR-S208D

Performance

Swipe horizontally to view full table.

Resolution	≦ 110 nm
NA	0.82
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 10 nm
Throughput	≧ 147 wafers/hour (300 mm wafer, 76 shots)

NSR-S207D

Performance

Swipe horizontally to view full table.

Resolution	≦ 110 nm
NA	0.82
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 10 nm

NSR-SF200

Performance

Swipe horizontally to view full table.

Resolution	≦ 150 nm
NA	0.63
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 28 nm
Throughput	≧ 110 wafers/hour (300 mm wafer) ≧ 120 wafers/hour (200 mm wafer)

NSR-S206D

Performance

Swipe horizontally to view full table.

Resolution	≦ 110 nm
NA	0.82
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy	≦ 20 nm

NSR-S205C

Performance

Swipe horizontally to view full table.

Resolution	≦ 130 nm
NA	0.75
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 30 nm

NSR-S204B

Performance

Swipe horizontally to view full table.

Resolution	≦ 150 nm
NA	0.68
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 35 nm

NSR-S203B

Performance

Swipe horizontally to view full table.

Resolution	≦ 180 nm
NA	0.68
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 40 nm

NSR-S202A

Performance

Swipe horizontally to view full table.

Resolution	≦ 250 nm
NA	0.60
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 45 nm

NSR-2205EX14C

Performance

Swipe horizontally to view full table.

Resolution	≦ 250 nm
NA	0.60
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 50 nm
Alignment system	LSA (standard), FIA (standard), LIA (optional)

NSR-2205EX12B

Performance

Swipe horizontally to view full table.

Resolution	≦ 280 nm
NA	0.55
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 55 nm
Alignment system	LSA (standard), FIA (standard), LIA (optional)

NSR-S201A

Performance

Swipe horizontally to view full table.

Resolution	≦ 250 nm
NA	0.60
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 50 nm

NSR-2205EX10B

Performance

Swipe horizontally to view full table.

Resolution	≦ 320 nm
Exposure light source	KrF excimer laser (248 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 80 nm

i-line Steppers

NSR-2205i14E2

Performance

Swipe horizontally to view full table.

Resolution	≦ 350 nm
NA	0.63
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Overlay	≦ 40 nm
Throughput	≧ 103 wafers/hour (200 mm wafer)

NSR-SF150

Performance

Swipe horizontally to view full table.

Resolution	≦ 280 nm
NA	0.62
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 25 nm
Throughput	≧ 180 wafers/hour (300 mm wafer, 76 shots)

NSR-SF140

Performance

Swipe horizontally to view full table.

Resolution	≦ 280 nm
NA	0.62
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 35 nm
Throughput	≧ 117 wafers/hour (300 mm wafer, 76 shots)

NSR-SF130

Performance

Swipe horizontally to view full table.

Resolution	≦ 280 nm
NA	0.62
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:4
Exposure field	26 × 33 mm
Alignment accuracy	≦ 35 nm
Throughput	≧ 120 wafers/hour (300 mm wafer) ≧ 120 wafers/hour (200 mm wafer)

NSR-SF120

Performance

Swipe horizontally to view full table.

Resolution	≦ 280 nm
NA	0.62
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy	≦ 35 nm
Throughput	≧ 100 wafers/hour (300 mm wafer) ≧ 120 wafers/hour (200 mm wafer)

NSR-SF100

Performance

Swipe horizontally to view full table.

Resolution	≦ 400 nm
NA	0.52
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:4
Exposure field	25 × 33 mm
Alignment accuracy	≦ 45 nm
Throughput	≧ 80 wafers/hour (300 mm wafer) ≧ 120 wafers/hour (200 mm wafer)

NSR-2205i12D

Performance

Swipe horizontally to view full table.

Resolution	≦ 350 nm
NA	0.63
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle)
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 55 nm

NSR-TFHi12

Performance

Swipe horizontally to view full table.

Resolution	≦ 500 nm
NA	0.30 ~ 0.45 (variable)
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 55 nm

NSR-2205i14E

Performance

Swipe horizontally to view full table.

Resolution	≦ 350 nm
NA	0.63
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 50 nm
Alignment system	LSA (standard), FIA (standard), LIA (optional)

NSR-4425i

Performance

Swipe horizontally to view full table.

Resolution	≦ 700 nm
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:2.5
Exposure field	44 mm square
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 100 nm

NSR-2205i11D

Performance

Swipe horizontally to view full table.

Resolution	≦ 350 nm
NA	0.63
Exposure light source	i-line (365 nm wavelength)
Reduction ratio	1:5
Exposure field	22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, \|M\| + 3σ)	≦ 70 nm
Alignment system	LSA (standard), FIA (optional), LIA (optional)

Metrology/Inspection Systems

Automatic Macro Inspection System AMI-5600/3500/3000 MarkⅡ

Lineup

Products archive