5x Reduction i-line StepperNSR-2205iL1

New Product Information
Announcement on August 31, 2023

Lithography system that is compatible with existing systems while responding to a wide variety of process demands

The NSR-2205iL1 is an i-line stepper that will be utilized to manufacture a wide range of devices. It provides excellent affordability and will enable optimized production of various semiconductor devices regardless of the wafer material. It is fully compatible with existing Nikon i-line lithography systems and can be used to supplement or replace existing steppers that no longer meet manufacturing requirements.

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NSR-2205iL1

Features of NSR-2205iL1

Feature 1:Supports a variety of needs, Excellent affordability, Feature 2:Compatible with existing Nikon products (photomasks, recipes, etc.), Feature 3:Developed with a focus on sustainability

Feature 1: Supports a variety of needs/Excellent affordability

Supports a variety of devices such as
power and communications semiconductors and MEMS

Products positioning map

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  • Accommodates various wafer sizes, thickness, and warpage
  • Responds to wafer size switching, expanding customer's usage range
  • Equipped with Wide DOF (expanded depth of focus range) and multipoint AF (autofocus)
  • Supports customers' varied production applications including SiC (silicon carbide) and GaN (gallium nitride) processes

Feature 2: Compatible with existing Nikon products

Feature 3: Developed with a focus on sustainability

Customers' assets, such as photomasks and recipes, are usable

Continuously supports customers' device production with the goal of being a long term business partner to our customers

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Existing photomasks and recipes can be reused

Improved maintainability, ease of repair and support

Sustainable design for current and future manufacturing

Main specifications of NSR-2205iL1

Resolution ≦ 350 nm*1
NA 0.45
Exposure light source i-line (365 nm wavelength)
Reduction ratio 1:5
Maximum exposure field 22 mm × 22 mm
Overlay SMO*2: ≦ 70 nm*1
Main options
  • Handles transparent wafer
  • Accommodates various wafer thickness and warpage
  • Applicable wafer size: 2 to 8 inches
  • Accommodates different wafer sizes
  • Backside alignment (IR transmission type)
  • Wide DOF expansion function
  • Multipoint AF function (improving the leveling correction performance)
  • *1When option is applied
  • *2Single Machine Overlay: machine-to-self overlay accuracy

Click here for details of this product.

Events

  • SEMICON China 2025Open in a new window

    Mar. 26-28, 2025
    Shanghai New International Expo Centre, Shanghai, China

Please feel free to contact us

We look forward to responding to your inquiries and consultations regarding NSR-2205iL1 5x reduction i-line stepper. Please feel free to contact us.

Inquiries