The NSR-SF200 is the world's first KrF excimer laser scan field stepper. It is designed to deliver superior cost performance in a mix-and-match scheme with ArF scanner employed on 300mm wafer lines for the mass production of advanced 90nm devices. The NSR-SF200 provides a large exposure field of 26 x 33mm, enabling resolution of 150nm or better. It is extremely well-suited for the exposure of next-generation DRAM and MPU middle layers.
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| Resolution |
150nm or better |
| NA |
0.63 |
| Exposure light source |
KrF excimer laser (248nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
26×33mm |
Alignment accuracy
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28nm or better  |
| Throughput |
300mm wafers: 110 or more wafers /hour;
200mm wafers: 120 or more wafers /hour |
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Leaflet (236KB)