The cutting-edge NSR-S208D KrF scanner has been designed for the mass production of 110nm or smaller devices. Featuring a high NA (0.82) projection lens and a 248nm-wavelength KrF excimer laser, the new stepper also boasts a new body design which contributes to increased throughput (140 or more per hour for 300mm wafers), along with enhanced alignment accuracy.
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| Resolution |
110nm or better |
| NA |
0.82 |
| Exposure light source |
KrF excimer laser (248nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
26×33mm |
Alignment accuracy
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10nm or better  |
| Throughput |
147 or more per hour for 300mm wafers (Step Pitch 26 x 33mm, 76 Shots, 8-point EGA, Exposure dose 30mJ/㎠) |
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Leaflet (281KB)