| The KrF scanner NSR-S205C delivers high throughput to 300mm wafer volume production lines. The high NA projection lens provides full support for 130nm lithography. |
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| Resolution |
130nm or better |
| NA |
0.75 |
| Exposure light source |
KrF excimer laser (248nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
25 x 33mm |
Alignment accuracy 
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30nm or better (FIA, LIA) |
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Leaflet (253KB)