The new NSR-SF130 i-line scan field stepper is a highly effective system for mass production of non-critical layers of next-generation DRAMs and MPUs. It is designed to deliver superior cost performance in a mix-and-match strategy with Nikon DUV excimer steppers, which are now the key systems in state-of-the-art semiconductor fab lines. The NSR-SF130 provides a large exposure field of 26 x 33mm, offering resolution of 280nm or better, and boasts a high throughput of 120 or more 300mm wafers/hour.
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| Resolution |
280nm or better |
| NA |
0.62 |
| Exposure light source |
i-line (365nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
26×33mm |
Alignment accuracy
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35nm or better |
| Throughput |
300mm wafers: 120 or more wafers/hour;
200mm wafers: 120 or more wafers/hour |
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Leaflet (237KB)