The ArF Immersion Scanner NSR-S609B features a projection lens that employs immersion lithography technology to provide an ultrahigh NA of 1.07. A new tandem stage achieves higher throughput. The projection lens supports a 193nm-wavelength ArF excimer laser, enabling production of the most advanced 55nm devices.
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| Resolution |
55nm or better |
| NA |
1.07 |
| Exposure light source |
ArF excimer laser (193nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
26×33mm |
Alignment accuracy
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7nm or better  |
| Throughput |
300mm wafers:130 or more wafers/hour |
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Leaflet
(313KB)