| Research-Use Inverted Microscope with Auto-Exposure Photomicrographic Equipment |
• Both brightfield and darkfield observations possible
• Intermediate magnification (2.5X zoom from 0.8X to 2X)
• Simple changeover between the built-in photomicrographic equipment (with separate controller), 35mm and large-format cameras
lete application of ergonomic design including its basic design that is SEMI compliant
• New large stage with a 151 x 100 mm cross travel capable of making diascopic observations of large-sized PCBs
• L-UEPI Universal Epi-illuminator ESD supports brightfield, darkfield, DIC, and simple polarizing observations
• Inherits single DIC system incorporating DIC slider with built-in nosepiece to support all objectives.
• DIC images with negligible color aberration are possible.
• Perfect for measurements of minute geometries
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