Through nearly 100 years of R&D efforts for the development of high-quality optical materials, Nikon proudly offers our state-of-the-art synthetic silica glass and calcium fluoride for use in the most advanced and challenging applications.
Synthetic Silica Glass Wafer
Made from Nikon's ultra-pure synthetic silica glass, these wafers can be produced in a variety of sizes down to a minimum thickness of 0.4 mm.
Photomask Substrates for FPD
Made from high-purity synthetic silica glass, with production sizes of up to approximately 2,000 mm in length, Nikon photomask substrates are ideal for any generation FPD equipment.