Exposure Systems Optimal for Production of High Definition LCDsNikon Releases new LCD steppers FX-803M & FX-903N

Nikon Corporation (Michio Kariya, President) announced today that it has developed two types of LCD steppers, FX-803M & FX-903N, and will start accepting orders in April, 2007. These are flat panel display exposure systems optimal for producing high-definition, mid-to-small size liquid crystal displays (LCDs) that are expected to see increasing demand for cellular phones and in-vehicle applications.
Productivity of FX-803M has improved by more than 10% compared to the current systems. FX-903N, capable of similar productivity as FX-803M, realizes a resolution of 1.5 μm due to a newly developed large diameter i-line lens.

FX-903N

FX-803M

Sales Summary

Development Background

As used for cellular phones and car navigation systems, liquid crystal displays with "more beautiful image, more vivid moving image" have been increasing in demand. This is because digital terrestrial broadcasting has become widespread and high mega pixel CCDs have been adopted for digital camera functions. FX-803M and FX-903N were developed as exposure systems that realize high resolution, high accuracy alignment, and high productivity for producing these high-definition, mid-to-small LCDs. The well-established stepper exposure method, proven for production of mid-to-small LCDs, is adopted.

Main Features of FX-803M & FX-903N

1. Large Plate Applications Using Stepper Method
   The new models support a large plate size of 730mm x 920mm, which means that it is possible to produce, from one plate, 294 panels of Type 2 or 84 panels of Type 4 LCDs.
2. Realization of high-definition LCD Production
   The adoption of a newly developed large diameter, low aberration i-line projection lens enables a high resolution of 1.5μm(3μm for FX-803M). In addition, by utilizing the stepper method and a highly accurate 6” reticle, high alignment accuracy is achieved, making it possible to produce high definition LCDs.
3. Supports Multi-Model Production
   With options, the reticle library of the exposure system is capable of loading up to 60 reticles and to manufacture multi-model panels.

Specifications